| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for applying a resist wherewith a substrate can be stably held without fail by forming a hand groove, into which the hand of a substrate-placing means comes in, at the leeward side of a motor-driven rotary stage having a substrate-supporting means and a substrate-holding means. SOLUTION: The hand 6 of a mask transfer means 9 carrying a mask 3 is dropped off on a rotary stage 11, and the underside of the mask 3 is supported with a mask support spacer 12. The hand 6 is further lowered and is put into a hand groove 16 formed at the leeward side 13b. Then, an air cylinder 17 is opened to move the hand 6 outwardly to separate it from the rotary stage 11, thus completing the transfer. The mask 3 is taken out by the inverse motion of the mask transfer means 9. The mask 3 is held with four holding pins 13 to inhibit the transfer durig rotation. The height of the mask support spacer 12 is set at 1 mm or lower to prevent a resist from coming into the gap between the mask 3 and the upper surface of the rotary stage 11. Thus, a substrate can be stably held without fail. |
