发明名称 PHOTOCURABLE COMPOSITION CONTAINING IODONIUM SALT COMPOUND
摘要 PROBLEM TO BE SOLVED: To obtain the subject composition useful for a coating material, or the like, having slight discoloration of an iodonium salt compound, capable of being synthesized in a high yield and readily, sensitive to an active energy ray irradiation such as light, electron ray in high sensitivity by making the composition include a specific diaryliodonium salt compound. SOLUTION: This composition comprises at least one kind of a diaryliodonium salt compound of formula I R1 and R2 are each H, a (substituted) alkyl, a (substituted) cycloalkyl or the like; (a) and (b) are each 1-4; Y is a nonnucleophilic anion residue; A is a group of formula II [B is a (substituted) alkylene or a (substituted) pheylene; (i), (j) and (k) are each 0 or 1; R3 and R4 are each H, a halogen, a (substituted) alkyl or the like; (c) and (d) are each 1-5]}, preferably further contains a cationic polymerizable compound, a sensitizer (especially, a 9,10-dialkoxyanthracene derivative, or the like), a pigment and a radically polymerizable compound.
申请公布号 JP2000119306(A) 申请公布日期 2000.04.25
申请号 JP19990076916 申请日期 1999.03.19
申请人 NIPPON SODA CO LTD 发明人 TAKAHASHI EIJI;SHIRAI AKIHIRO;TAKAHASHI HIROSHI;KIMIZUKA SHINICHI
分类号 C08G65/00;C08F2/48;C08G59/68;C08G65/10;C08G65/18;C08G85/00;(IPC1-7):C08F2/48 主分类号 C08G65/00
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