发明名称 |
STATIC RANDOM ACCESS MEMORY CELL AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
PURPOSE: A method of manufacturing a static random access memory(SRAM) cell is provided to improve a characteristic of a device by eliminating a parasitic P-N diode. CONSTITUTION: A method of manufacturing a static random access memory(SRAM) cell comprises the steps of: defining an active region by forming a field oxidation layer on a semiconductor substrate having a well and forming an access transistor and a driver transistor; sequentially forming a first insulation layer, a ground potential line and a second insulation layer on the entire structure having the driver transistor; forming a node contact hole by sequentially etching a selected part of the second and the first insulation layers to expose a part of the gate of the driver transistor and a part of the active region; forming a metal plug in the node contact hole; and a thin film transistor electrically connected with the metal plug.
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申请公布号 |
KR20000021364(A) |
申请公布日期 |
2000.04.25 |
申请号 |
KR19980040390 |
申请日期 |
1998.09.28 |
申请人 |
HYUNDAI ELECTRONICS IND. CO., LTD. |
发明人 |
IN, SEONG UK;SHIN, WON HO |
分类号 |
H01L27/11;(IPC1-7):H01L27/11 |
主分类号 |
H01L27/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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