发明名称 Method and apparatus for germanium reclamation from chemical vapor deposition
摘要 A continuous system recovers germanium (Ge) from a chemical vapor deposit. A chemical vapor deposit scrubber scrubs a chemical vapor deposit to form a chemical vapor deposit scrubber solution. An equalization and neutralization mixer adds a caustic soda to the chemical vapor deposit scrubber solution to form an equalization and neutralization mixer solution having a pH above 12.0 to maintain the solubility of silicon oxide (SiO2) and hypochlorite (ClO-). A hypochlorite reduction mixer adds a peroxide to the equalization and neutralization solution to form a hypochlorite reduction solution to reduce hypochlorites. A precipitant and neutralization mixer adds a metal cation such as Epsom Salts (MgSO4) and a caustic soda, such as sodium hydroxide (NAOH), to the hypochlorite reduction solution to form a precipitant and neutralization solution to precipitate magnesium germanate (MgGeO3) and magnesium metasilicate (MgSiO3). A reactor tank adds a polymer to the precipitant and neutralization solution to flocculate the germanium (Ge) and silicon (Si) solids and form a flocculation solution. A plate clarifier collects the flocculation solution to form a flocculated material. A filter press and the dryer produces a dry sludge of germanium (Ge) within a range of 5%-10% by weight.
申请公布号 US6054104(A) 申请公布日期 2000.04.25
申请号 US19980007296 申请日期 1998.01.14
申请人 ALCATEL 发明人 LANKEWICZ, DAVID W.;REILLY, BRUCE D.
分类号 B01D53/64;B01D53/73;C01G17/00;C03B37/014;C03B37/018;C22B7/00;C22B41/00;(IPC1-7):C01G17/00 主分类号 B01D53/64
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