发明名称 |
Method and apparatus for germanium reclamation from chemical vapor deposition |
摘要 |
A continuous system recovers germanium (Ge) from a chemical vapor deposit. A chemical vapor deposit scrubber scrubs a chemical vapor deposit to form a chemical vapor deposit scrubber solution. An equalization and neutralization mixer adds a caustic soda to the chemical vapor deposit scrubber solution to form an equalization and neutralization mixer solution having a pH above 12.0 to maintain the solubility of silicon oxide (SiO2) and hypochlorite (ClO-). A hypochlorite reduction mixer adds a peroxide to the equalization and neutralization solution to form a hypochlorite reduction solution to reduce hypochlorites. A precipitant and neutralization mixer adds a metal cation such as Epsom Salts (MgSO4) and a caustic soda, such as sodium hydroxide (NAOH), to the hypochlorite reduction solution to form a precipitant and neutralization solution to precipitate magnesium germanate (MgGeO3) and magnesium metasilicate (MgSiO3). A reactor tank adds a polymer to the precipitant and neutralization solution to flocculate the germanium (Ge) and silicon (Si) solids and form a flocculation solution. A plate clarifier collects the flocculation solution to form a flocculated material. A filter press and the dryer produces a dry sludge of germanium (Ge) within a range of 5%-10% by weight.
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申请公布号 |
US6054104(A) |
申请公布日期 |
2000.04.25 |
申请号 |
US19980007296 |
申请日期 |
1998.01.14 |
申请人 |
ALCATEL |
发明人 |
LANKEWICZ, DAVID W.;REILLY, BRUCE D. |
分类号 |
B01D53/64;B01D53/73;C01G17/00;C03B37/014;C03B37/018;C22B7/00;C22B41/00;(IPC1-7):C01G17/00 |
主分类号 |
B01D53/64 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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