QUARTZ GLASS COMPONENT FOR A REACTOR HOUSING AND METHOD FOR ITS PRODUCTION AND APPLICATION

摘要

PURPOSE: A quartz glass component for a reaction chamber, especially of plasma etching is prepared which contains the substrate of the second quarts glass having time-constant roughness by open pores on that of the first quarts glass as an essential step. CONSTITUTION: A quartz glass component for reaction housing consists of: containing an inner side having an average roughness depth, Aa, of over 1 micro meter which is faced the substrate of a first quarts glass; forming a range(5) of roughness by open pores on the substrate of the second quarts glass which does not form any particles, has high adhesion to materials built up on it and long time use. The preparation method thereof contains; forming blank composed of particles containing SiO2; heating at over 1000°C for being glass completely or partially.