WET ETCHING EQUIPMENT OF SEMICONDUCTOR

摘要

PURPOSE: A wet etching equipment of a semiconductor is to treat a wafer uniformly by preventing a partial eddy or a stagnated zone from generating in a bath. CONSTITUTION: In a wet etching equipment of a semiconductor, a bath(10) accommodates a small amount of chemical. A chemical supplying unit supplies a predetermined amount of chemical to the bath. A chemical exhausting unit exhausts the chemical accommodated in the bath to the outside. A wafer guide(30) locates a plurality of wafers(1) fixed horizontally so that a used surface of the wafer looks down, in a chemical solution. A transporting robot loads and unloads the water into the wafer guide. A chemical jetting unit(20) jets the chemical on the surface of the wafer at high pressure so that a flow of the chemical is formed. The bath has a cylinder shape with an upper surface opened.