发明名称 POLYESTER FILM FOR VAPOR DEPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a polyester film for vapor deposition excellent in vapor deposition workability and gas barrier properties. SOLUTION: This film is composed of a polyester A comprising a dicarboxylic acid component having terephthalic acid and isophthalic acid as the main components, and a glycol component having ethylene glycol as the main component, the polyester A having a 1,3-bis(2-hydroxyethoxy) benzene component in the range of 0.1-10 wt.%.
申请公布号 JP2000119414(A) 申请公布日期 2000.04.25
申请号 JP19980290474 申请日期 1998.10.13
申请人 TORAY IND INC 发明人 HASHIMOTO KOKICHI;MATSUSHIMA HIROKO;KIMURA MASAHIRO
分类号 C08J5/18;B32B27/36;C08K5/01;C08L67/02;C23C14/08;(IPC1-7):C08J5/18 主分类号 C08J5/18
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