发明名称 Semiconductor memory cell and method of manufacturing the same
摘要 A semiconductor memory cell comprising (1) a first transistor of a first conductivity type for read-out having source/drain regions composed of a surface region of a third region and a second region and a channel forming region composed of a surface region of a first region, (2) a second transistor of a second conductivity type for write-in having source/drain regions composed of the first region and a fourth region and a channel forming region composed of a surface region of the third region, and (3) a junction-field-effect transistor of a first conductivity type for current control having gate regions composed of the fourth region and a portion of the first region facing the fourth region, a channel region composed of the third region sandwiched by the fourth region and the first region and source/drain regions composed of the third region.
申请公布号 US6055182(A) 申请公布日期 2000.04.25
申请号 US19980053026 申请日期 1998.04.01
申请人 SONY CORPORATION 发明人 MUKAI, MIKIO;HAYASHI, YUTAKA
分类号 H01L27/108;G11C11/401;G11C11/403;G11C11/405;H01L21/8242;(IPC1-7):H01L29/76 主分类号 H01L27/108
代理机构 代理人
主权项
地址