MECHANICAL SCAN APPARATUS OF ION IMPLANTER

摘要

PURPOSE: A mechanical scan apparatus of ion implanter is provided to prevent a wafer from polluting of a wafer by protecting surface of a table from direct attack of ion beam. CONSTITUTION: A mechanical scan apparatus comprises a plurality of wafer suscepter(6)same spaced apart form each other and a table(4) for rotating and loading wafers. A conductive layer(12) is coated on the entire surface of the table(4) except for portions formed the wafer suscepter(6) and grounded, so that ion beams irradiated to table(4) are being not direct attack to the table(4), thereby protecting the surface of the table(4) from the irradiated ion beams.