| 摘要 |
PURPOSE: An apparatus for guiding a stop position of a robot is to eliminate an accumulative error generated in a driving portion which drives a robot so as to enter a wafer into a chemical bath at an exact position, thereby improving a reliability of the apparatus. CONSTITUTION: A robot(R) used in a wet station raises up/down a carrier containing wafer sand simultaneously moves along a lack rail(34) horizontally and performs an etching process through a plurality of chemical baths. In an apparatus(40) for guiding a stop position of the robot, a cylinder(41) is mounted at a side of the robot so that an end of a rod(42) of the cylinder is supported along a slide portion of the lack rail, when the robot is horizontally moved. If the robot is detached from a right position of each bath, an accumulative error is compensated by correcting a position of the robot. The lack rail is formed with a lack gear at an upper portion thereof, which is engaged with a pinion(33) fixed to a motor shaft(32) of a motor(31) for driving the robot and guides the robot, and a stop groove(35) at a side thereof. A roller is installed in the rod end of the cylinder in order to be rotated along the side of the lack rail.
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