发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 PURPOSE: A semiconductor device is provided to prevent a reaction with a high ferroelectric substance and an insulation membrane between layers as well as to prevent a membrane separation by mounting a reaction prevention membrane and a diffusion prevention membrane. CONSTITUTION: A capacitor is embedded in a diffusion prevention layer(51) on which a lower electrode, a high ferroelectric substance membrane(71), and an upper electrode(72) are formed. The high ferroelectric substance membrane(71) and the upper electrode(72) are in a pattern corresponding to each memory cell and exist over plural memory cells. The diffusion prevention layer(51) is embedded in a reaction prevention layer(43) and not oxidized when heat-processing for crystalization of the high ferroelectric substance(71).
申请公布号 KR20000022925(A) 申请公布日期 2000.04.25
申请号 KR19990037619 申请日期 1999.09.06
申请人 HITACHI, LTD. 发明人 TORII KAZYOSHI;MIKI HIROSHI;HUJISAKI YOSHIHISHA
分类号 H01L27/10;H01L21/02;H01L21/285;H01L21/8242;H01L21/8246;H01L27/105;H01L27/108;(IPC1-7):H01L27/10 主分类号 H01L27/10
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