发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
PURPOSE: A semiconductor device is provided to prevent a reaction with a high ferroelectric substance and an insulation membrane between layers as well as to prevent a membrane separation by mounting a reaction prevention membrane and a diffusion prevention membrane. CONSTITUTION: A capacitor is embedded in a diffusion prevention layer(51) on which a lower electrode, a high ferroelectric substance membrane(71), and an upper electrode(72) are formed. The high ferroelectric substance membrane(71) and the upper electrode(72) are in a pattern corresponding to each memory cell and exist over plural memory cells. The diffusion prevention layer(51) is embedded in a reaction prevention layer(43) and not oxidized when heat-processing for crystalization of the high ferroelectric substance(71).
|
申请公布号 |
KR20000022925(A) |
申请公布日期 |
2000.04.25 |
申请号 |
KR19990037619 |
申请日期 |
1999.09.06 |
申请人 |
HITACHI, LTD. |
发明人 |
TORII KAZYOSHI;MIKI HIROSHI;HUJISAKI YOSHIHISHA |
分类号 |
H01L27/10;H01L21/02;H01L21/285;H01L21/8242;H01L21/8246;H01L27/105;H01L27/108;(IPC1-7):H01L27/10 |
主分类号 |
H01L27/10 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|