发明名称 FOCUSING METHOD OF LENS FOR EXPOSURE APPARATUS
摘要 PURPOSE: A focusing method of a lens is to focus a central part of the lens as well as a peripheral part thereof. CONSTITUTION: A focusing method comprises steps of: placing and arranging a focusing wafer (20) on a wafer stage(10); and irradiating on the focusing wafer a light passing through a reticle and a lens(30) to expose focusing patterns. The lens is focused by determining whether the focusing patterns are precisely exposed on the focusing wafer. Further, focusing patterns passing through both a central part and a peripheral part of the lens are exposed on the focusing wafer, thereby focusing the lens.
申请公布号 KR20000021730(A) 申请公布日期 2000.04.25
申请号 KR19980040979 申请日期 1998.09.30
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 SIM, BEOM SIK;KWAK, SI YEONG;CHOI, BYEONG CHEOL;OK, EUN YEONG
分类号 H01L21/027;G03F7/20;G03F9/00;(IPC1-7):H01L21/027 主分类号 H01L21/027
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