发明名称 |
FOCUSING METHOD OF LENS FOR EXPOSURE APPARATUS |
摘要 |
PURPOSE: A focusing method of a lens is to focus a central part of the lens as well as a peripheral part thereof. CONSTITUTION: A focusing method comprises steps of: placing and arranging a focusing wafer (20) on a wafer stage(10); and irradiating on the focusing wafer a light passing through a reticle and a lens(30) to expose focusing patterns. The lens is focused by determining whether the focusing patterns are precisely exposed on the focusing wafer. Further, focusing patterns passing through both a central part and a peripheral part of the lens are exposed on the focusing wafer, thereby focusing the lens.
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申请公布号 |
KR20000021730(A) |
申请公布日期 |
2000.04.25 |
申请号 |
KR19980040979 |
申请日期 |
1998.09.30 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
SIM, BEOM SIK;KWAK, SI YEONG;CHOI, BYEONG CHEOL;OK, EUN YEONG |
分类号 |
H01L21/027;G03F7/20;G03F9/00;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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