发明名称 MANUFACTURE OF THIN FILM
摘要 PROBLEM TO BE SOLVED: To manufacture an anti-fogging film which is durable in anti-fogging effect and without deteriorating the optical property, and an anti-staining film which is excellent in durability and without deteriorating the reflection preventive effect. SOLUTION: A thin film manufacturing method includes a process in which a first target mainly consisting of titanium and a second target consisting mainly of silicon are installed in a vacuum chamber, a first sputtering process in which a substance of either of the first target or the second target is deposited on a substrate by a sputtering method, a second sputtering method in which a substance of the other target of the first target or the second target is deposited on the substrate and a mixture film forming process in which the substance deposited on the substrate is oxidized to form a thin film of the mixture consisting mainly of silicon oxide and titanium oxide after the first and second sputtering processes are completed.
申请公布号 JP2000119846(A) 申请公布日期 2000.04.25
申请号 JP19980290856 申请日期 1998.10.13
申请人 NIKON CORP 发明人 OHASHI KAZUNORI;KIMURA FUMITO
分类号 C08J7/06;C23C14/08;G02B1/10;G02B5/08;G02C7/02 主分类号 C08J7/06
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