| 摘要 |
PURPOSE: An apparatus is provided to obtain good images without a deterioration of a resolution in case of using a reflection-type mask by forming an image of a predetermined pattern on an exposure substrate. CONSTITUTION: A light source(100) irradiates light rays. An illuminating system(4, 5, 6, 8)forwards the irradiated rays to a reflection-type mask on which a predetermined pattern is formed. A projection optic system(10) forwards the irradiated rays reflected from the reflection-type mask to an exposed substrate(11) and forms the predetermined pattern on the exposed substrate(11). A scanning driver relatively moves at least one of the reflection-type mask and the exposed substrate(11). The illuminating system(4, 5, 6, 8) includes a field stop(7) is closely arranged at a position to be matched with the reflection-type mask.
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