| 摘要 |
<p>PROBLEM TO BE SOLVED: To securely peel a photosensitive material to be capable of coping with all etching methods to be used, on the preceding stage of a device peeling a sensitive material from a substrate by using a chemical with an another preceding stage part facilitating the peeling. SOLUTION: At the time of peeling a photosensitive material after etching from a substrate, a nylon brush has been set to the preceding stage 101 of a peeling brush 102, and, the surface of the substrate is rubbed in a dryly wiping state contrived in such a manner that it is not infiltrated with a peeling soln. and is not made wet. The diameter of the nylon brush is preferably controlled to about 0.1 mm, and, as to the number of the brushes, one or two pieces are sufficient, but, in consideration of the unevenness of peeling, the brushes different in the rotary direction are set each by one piece. The speed of rotation of the brushes is controlled to about >=1000 rpm, preferably to about 1400 to 2000 rpm, the carrying speed is controlled to about 1000 mm/min, and, as to the pressing pressure, the load of a motor is measured by current value, and it is set so as to be increased by about 0.2 A to the initial value.</p> |
