METHOD FOR FORMING CARBON COATED FILM ON SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To form a carbon coated film low in internal stress and high in stress stability on a substrate. SOLUTION: A carbon coated film forming method includes (a) a step in which a carbon layer of a predetermined thickness having mainly a graphite structure or a monolithic structure is deposited on a substrate 2, and (b) a step in which the carbon layer is treated by high frequency discharge in a helium atmosphere in the condition that the substrate 2 is kept at a negative DC bias voltage selected in advance. The thickness not larger than the longitudinal stop range of the helium ion corresponding to the bias voltage to be used in the step (b) is selected as the thickness of the carbon layer deposited in the step (a).