PHOTOSENSITIVE RESIN ASHING RESIDUAL RINSING AGENT

摘要

PURPOSE: A photosensitive resin asking residual rinsing agent is provided to rarely corrode an insulation layer and an electric conductive layer on a wafer. CONSTITUTION: A photosensitive resin asking residual rinsing agent comprises a fluorine ammonium combination, and an aqueous solution. The aqueous solution contains an ammonium chloride as a positive ion and a surface active agent as a negative ion. The fluorine ammonium combination is a fluorine ammonium. A concentration of the fluorine ammonium combination 0.005-1 weight%, and a concentration of the surface active agent is 0.005-4.5 weight%.