发明名称 SUBSTRATE FOR RECORDING MEDIUM AND ITS PRODUCTION
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a substrate for a recording medium by which a rugged shape can be easily micronized by using a photolithography tecnique to attain high density in a recording region in the substrate for the recording medium having periodic rugged shapes as a recording region of magnetic information on one surface. SOLUTION: A carrying substrate 2 as the substrate for the recording medium of an optical magnetic recording medium is manufactured by repeating plural times one cycle of the photolithography composed of respective processes of resist coating, mask (closely adhering mask) formation, rugged part formation, mask (closely adhering mask) removal onto a wafer 10. At this time, in a mask forming process of the next cycle, patterns corresponding to projected parts 6b in a closely adhering mask M2 are formed by shifting the same so as not to overlap the projected parts 6a formed by the former cycle are rugged parts 6, 7 having a projected shape of periodic interval smaller than a pattern periodic interval P1 of the closely contact mask M2 are formed.
申请公布号 JP2000113533(A) 申请公布日期 2000.04.21
申请号 JP19980288184 申请日期 1998.10.09
申请人 DENSO CORP 发明人 OOHARA ATSUSHI;KAWAHARA NOBUAKI
分类号 G11B5/82;G11B5/73;G11B5/84;G11B11/10;(IPC1-7):G11B11/10 主分类号 G11B5/82
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