| 摘要 |
PROBLEM TO BE SOLVED: To provide the dopant gas feeding and exhausting device for an ArF excimer laser for increasing and stabilizing a power by setting the concentration of dopant gas within a prescribed range. SOLUTION: The addition gas feeding and exhausting device of an ArF excimer laser is provided with an adding module 4 for adding at least one dopant gas among oxygen, carbon dioxide, nitrogen, or carbon tetrafluoride to a chamber 1, dopant gas monitor 5 for detecting concentration C in the chamber 1 of the dopant gas, and gas control unit 6 for controlling the feeding and exhaust of the dopant gas so that the concentration C can be set within a prescribed range. The dopant module 4 is provided with a dopant gas bomb 20 for packing the dopant gas and a dopant valve 20 for introducing the addition gas to the chamber 1. |
