PHOTOSENSITIVE POLYIMIDE PRECURSOR COMPOSITION AND PRODUCTION OF PATTERN USING THAT

摘要

PROBLEM TO BE SOLVED: To obtain a photosensitive polyimide precursor compsn. having excellent photosensitive characteristics from which a good pattern having an excellent profile can be obtd. with low exposure by incorporating a polyimide precursor having photopolymerizable carbon-carbon double bonds and a specified photoinitiator. SOLUTION: This compsn. contains a hexaryl biimidazole compd. expressed by formula I and titanocene compd. expressed by formula II as a polyimide precursor having photopolymerizable carbon-carbon double bonds and as a photoinitiator. In formulae, X, X' and X" are alkyl groups, halogen atoms, trihalomethyl groups, nitro groups, alkoxy groups or groups expressed by formula III, p, q and r are integers of 0 to 5, R1 and R2 are alkyl groups, R3 and R4 are hydrogen atoms or 1-10C alkyl groups and, Y, Y', Y", Z, Z' and Z" are hydrogen atoms, 1-10C alkyl groups or pyrrolyl groups.