发明名称 POSITIVE PHOTORESIST COATING LIQUID AND DISPLAY DEVICE SUBSTRATE USING SAME
摘要 <p>PROBLEM TO BE SOLVED: To provide a non-chemical amplifying positive photoresist coating liquid which enables formation of a coating film with uniform thickness all over a substrate, produces no particle and is excellent in storage stability, and to provide a base body for a display device. SOLUTION: The non-chemical amplifying positive photoresist coating liquid is prepared by dissolving an alkali-soluble resin and quinone diazide group-contg. compd. in a mixture solvent comprised of 60 to 98 wt.% propylene glycol monomethylether acetate or 3-methoxy methylpropionate and 40 to 2 wt.%γ-butylolactone. The resultant coating liquid is applied to form a coating film on a glass square substrate to obtain a base body for a display device.</p>
申请公布号 JP2000112120(A) 申请公布日期 2000.04.21
申请号 JP19980280766 申请日期 1998.10.02
申请人 TOKYO OHKA KOGYO CO LTD 发明人 KATO TETSUYA;AOKI TOMOSABURO
分类号 G03F7/004;G03F7/022 主分类号 G03F7/004
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