| 摘要 |
<p>PROBLEM TO BE SOLVED: To form org. polymeric alignment film, which has a uniform thickness with excellent flatness and which is excellent in uniformity of liq. crystal alignment by contg. a specific polymer and if necessary photo-polymerization initiator and one or more kinds of photo-sensitizer. SOLUTION: This photosensitive resin material contains a polymer having a structure expressed by a formula I as a main component and if necessary a photo-polymerization initiator and at least one kind of photo-polymerization. In the formula I, R is selected from a formula II and L is 1 or 2, and carboxyl group is bonded at a ortho-position against carbonyl group comprising a main chain. And each of m and n is individually 0 or 1, o is an integer of from 2 to 10, and R1 means hydrogen atom or 1-4C lower alkyl group. In this way, after coating on a full surface of substrate with spinner or the like, a chemical beam is irradiated with a fixed mask, and by removing an undesired area with developing treatment, an org. polymeric alignment film, which has uniform thickness with excellent flatness and which is excellent in uniformity of liq. crystal alignment is obtained.</p> |
