| 摘要 |
PROBLEM TO BE SOLVED: To obtain an apparatus and a method, in which the damage of a polishing cloth in a dressing operation is reduced as far as possible in which the life cycle of the polishing cloth is made long, and in which the clogging of a dresser is eliminated by a method wherein the dresser which contains an SiC film is used in a dressing process by the polishing cloth. SOLUTION: An SiC dresser has a structure in which a plurality of pellets 2 are attached to a discoidal dresser 1. The plurality of pellets 2 are attached so as to surround the circumference of the discoidal dresser 1. (c) The number of pellets is preferably set at eight or higher so that the respective pellets come into contact uniformly with a polishing cloth in a dressing operation. Every pellet 2 has a structure, in which an SiC film 5 is pasted on an Al base metal 3 by an epoxy-based adhesive 4. (b) In this case, as an adhesive, it is preferable to use an abrasive in which SiN particles as abrasive particles are added to an acidic solution. When acidic abrasive is used, the surface of the SiC dresser will not be modified.
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