发明名称 EXECUTE DEVICE, STAMP FORMING DEVICE, EXPOSURE METHOD AND STAMP FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an exposure device which contributes to the reduction of the size of the device while preventing the emission of waste, such as photosensitive films, at the time of stamp formation with a stamp forming device, the stamp forming device, an exposure method and a stamp forming method. SOLUTION: This exposure device is used for forming a pattern forming surface of a prescribed shape consisting of a photosensitive layer formed by exposing the photosensitive layer 64 formed on one surface of a body to be exposed, partially curing the photosensitive layer, removing the photosensitive layer of the uncured region and curing the photosensitive layer. The device has a display means 30 for forming and displaying the information on the pattern forming surface corresponding to the pattern forming surface. The device has a light source 14 which partially exposes the photosensitive layer 64 on the body to be exposed with the information on the pattern forming surface displayed on the display means 30 as a mask.
申请公布号 JP2000112140(A) 申请公布日期 2000.04.21
申请号 JP19980280217 申请日期 1998.10.01
申请人 SEIKO EPSON CORP 发明人 YAMAZAKI KATSUNORI;INOUE AKIRA;OZAWA YUTAKA
分类号 B41K1/02;G02F1/13;G03F7/20;(IPC1-7):G03F7/20 主分类号 B41K1/02
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