| 摘要 |
PROBLEM TO BE SOLVED: To provide a structure that can enlarge and effective area by maintaining a large surface area without increasing the height of functional parts such as a capacitor, etc., and so forth and an effective manufacture thereof. SOLUTION: Two exposure masks 70, 71 or 80, 81 are used (that is, exposure is performed twice) to expose the substrate into a stripe pattern at each time so that there will be less light interference than when exposure is performed once by using one exposure mask, and the obtained pattern of the mask 73 can be formed into a form generally identical to the required exposure pattern (for example, short side : long side = 1:3). Consequently, in the formed lower electrode 23, the surface area of a conductive layer 23 formed corresponding to the above exposure pattern (that is the effective area used as a capacitor) is increased. Thus, the capacitor surface area can be increased without increasing the element height of the capacitor (that is the height of the conductive layer 23). Therefore, no lead is added to other processes. |
