| 摘要 |
PROBLEM TO BE SOLVED: To perform accurate calibration of a substrate heat treatment, by calculating the temperature dependence of the effective reflectance, associated with a reference substrate based on both a conversion temperature obtained from the light emitting power fed to a light source and the output of a sensing means, while referring to a known power/temperature correlated information. SOLUTION: To a reflection plate 140 of a substrate heat-treatment apparatus 1, a light- emitting type calibrating apparatus 3 is attached, wherein a reference substrate SW with a known radiation factor is held, and a simplified lamp 323 is lit. The light of the lamp 323 is not projected directly on an optical waveguiding rod 156 present under a cavity portion CP. In the calibrating processing of the substrate heat-treatment apparatus 1, by a known conversion table the conversion temperature of the light into a reference substrate SW can be known in response to the feeding power to the simplified lamp 323, and the temperature dependence of the effective reflectance associated with the reference substrate SW is determined, based on the conversion temperature and the output of a sensor 156. Then, the light- emitting type calibrating apparatus 3 is removed, and a light-emitting portion is attached to the upper portion of the substrate heat-treatment apparatus 1 to perform heat treatment of a substrate with similar characteristics to the reference substrate SW, together with its temperature measurement based on the obtained temperature dependence of its effective reflectance.
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