发明名称 |
OPTICAL SYSTEM REGULATION METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide an optical system regulation method which allows the easy check of an irradiation range and irradiation intensity. SOLUTION: A thin film plate 62 formed with thin films 62b so as to stepwise change their film thicknesses on one surface of a substrate 62a is placed on a sample surface and the thin films 62b are irradiated with light. Accompanying the irradiation of the thin films 62b with the light, a phase transition (melting and evaporation) occurs in the thin films 62b according to the relation between the irradiation intensity of the light in the irradiation position thereof and the film thicknesses of the thin films 62b and holes are sometimes formed in the thin films 62b. The regulation of the optical system is executed while the presence or absence of the formation of such holes and the range thereof are checked.
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申请公布号 |
JP2000111841(A) |
申请公布日期 |
2000.04.21 |
申请号 |
JP19980281436 |
申请日期 |
1998.10.02 |
申请人 |
BUNSHI BIOPHOTONICS KENKYUSHO:KK |
发明人 |
WATANABE AKIHIKO;SUGA TAKAYUKI;OKAZAKI SHIGETOSHI;HIRAMATSU MITSUO |
分类号 |
G02B27/62;(IPC1-7):G02B27/62 |
主分类号 |
G02B27/62 |
代理机构 |
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代理人 |
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地址 |
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