| 摘要 |
PROBLEM TO BE SOLVED: To provide an image forming method using a heat-developable photosensitive material which is capable of a fast exposure specially for a photolithography, also especially for material for a scanner and image setter, and with which an image having a low fog, high Dmax (max. density) and little fluctuation of dots during heat development can be obtd. SOLUTION: In this method, an image is formed in a process of image-wise exposure and a process of heat development. The overlap coefft. defined as the ratio of the beam diameter used for the exposure expressed by the full-width at half maximum(FWHM) of the beam intensity to the subscanning pitch width is controlled to between 0.2 and 0.5. The exposure time is <10-7 sec for high luminance short time exposure. After heat development,γ(gradient of the line connecting the points of density 0.2 and 2.5 when the abscissa represents the logarithm of exposure does) satisfies 5<=γ<=15.
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