| 摘要 |
<p>PROBLEM TO BE SOLVED: To efficiently remove not only reticles adhered to the surface of an aperture but also fine particles adhered to the sidewall of an aperture. SOLUTION: A vertically rotating structure 2 is provided on a substrate 1, and a structure which is held on the horizontally moving structure 3 is moved in horizontal direction by the horizontally moving structure provided on the vertically rotating structure 2. A horizontally rotating structure 5 is provided on the supporting frame 4, and a vertically moving structure 6 is rotated about a horizontally rotating shaft. A reticle holder 7 can be moved in the vertical direction by the vertically moving structure 6. The laser beam 10 emitted from a pulse laser beam source 9 is condensed by a lens 11, and the laser beam is made to irradiate on the surface of the reticle 8 provided on the reticle holder 7. The incident direction of the pulse laser beam 10 for the surface of the reticle 8 can be changed to around X and Y-axes, and the pulse beam 10 can be made to irradiate on the side wall of the aperture part of a reticle 8.</p> |
