发明名称 |
CMOS TRANSISTOR TYPE SEMICONDUCTOR DEVICE AND ITS MANUFACTURE |
摘要 |
PROBLEM TO BE SOLVED: To reduce the variation of a TPD caused by the variation of the gate length of a MOS transistor constituting a CMOS transistor. SOLUTION: In a clocked CMOS transistor inverter, the capacitor electrodes 30a and 30b of a 1st capacitor part 30 connecting the source 12S (1st node 44) of a 2nd pMOS transistor 12 with a ground potential point 22 and the capacitor electrodes 32a and 32b of a 2nd capacitor part 32 connecting the source (3rd node 48) of a 1st nMOS transistor 14 with the ground potential point are made into rectangular patterns being parallel to each other. Also, they are formed together with a gate by polysilicon being the same material as the gate when the gate is formed.
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申请公布号 |
JP2000114960(A) |
申请公布日期 |
2000.04.21 |
申请号 |
JP19980281728 |
申请日期 |
1998.10.02 |
申请人 |
NEC IC MICROCOMPUT SYST LTD |
发明人 |
TOMOTA MASAFUMI |
分类号 |
H01L27/092;H01L21/8238;H03K19/096;(IPC1-7):H03K19/096;H01L21/823 |
主分类号 |
H01L27/092 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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