发明名称 SUBSTRATE AND APPARATUS FOR FLUOROMETRIC ANALYSIS
摘要 PROBLEM TO BE SOLVED: To provide a substrate and apparatus for fluorometric analysis in which fluorometric analysis can be conducted while prolonging the lifetime of fluorescence from a sample and enhancing S/N ration. SOLUTION: Since a substrate 1 for fluorometric analysis comprises a silicon substrate 2 and a silicon oxide film 3 of 10 nm-2.5μm thick formed on the side of the silicon substrate 2 to be bonded with a sample, quenching action of fluorescence due to the silicon substrate 2 is suppressed and the effect of noise light being emitted from the silicon oxide film 3 is reduced thus conducting fluorometric analysis efficiently. Furthermore, since the substrate for fluorometric analysis comprises a fluorescent region having the silicon oxide film 3 and a quenching region only of the silicon substrate 2, measurement efficiency can be enhanced significantly especially for a trace sample, e.g. a single molecule.
申请公布号 JP2000111477(A) 申请公布日期 2000.04.21
申请号 JP19980278453 申请日期 1998.09.30
申请人 HAMAMATSU PHOTONICS KK;AGENCY OF IND SCIENCE & TECHNOL 发明人 ISHIKAWA MITSURU;YASUDA TETSUJI
分类号 G01N21/64;G01N21/78;(IPC1-7):G01N21/64 主分类号 G01N21/64
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