发明名称 |
SUBSTRATE AND APPARATUS FOR FLUOROMETRIC ANALYSIS |
摘要 |
PROBLEM TO BE SOLVED: To provide a substrate and apparatus for fluorometric analysis in which fluorometric analysis can be conducted while prolonging the lifetime of fluorescence from a sample and enhancing S/N ration. SOLUTION: Since a substrate 1 for fluorometric analysis comprises a silicon substrate 2 and a silicon oxide film 3 of 10 nm-2.5μm thick formed on the side of the silicon substrate 2 to be bonded with a sample, quenching action of fluorescence due to the silicon substrate 2 is suppressed and the effect of noise light being emitted from the silicon oxide film 3 is reduced thus conducting fluorometric analysis efficiently. Furthermore, since the substrate for fluorometric analysis comprises a fluorescent region having the silicon oxide film 3 and a quenching region only of the silicon substrate 2, measurement efficiency can be enhanced significantly especially for a trace sample, e.g. a single molecule.
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申请公布号 |
JP2000111477(A) |
申请公布日期 |
2000.04.21 |
申请号 |
JP19980278453 |
申请日期 |
1998.09.30 |
申请人 |
HAMAMATSU PHOTONICS KK;AGENCY OF IND SCIENCE & TECHNOL |
发明人 |
ISHIKAWA MITSURU;YASUDA TETSUJI |
分类号 |
G01N21/64;G01N21/78;(IPC1-7):G01N21/64 |
主分类号 |
G01N21/64 |
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