发明名称 |
HIGH CONTRAST REDUCED ANTIREFLECTION MATERIAL, ITS PRODUCTION AND USE |
摘要 |
PROBLEM TO BE SOLVED: To provide a reduced antireflection material excellent in high contrast function and reduced antireflection function by providing an reduced antireflection layer obtained by curing a curable coating solution containing specified proportions of a fluorine-containing polyfunctional (meth)acrylic ester and a fluorine-containing polymer. SOLUTION: The reduced antireflection material has high contrast function and reduced antireflection function on the surface of the base material. The reduced antireflection function is ensured by a reduced antireflection layer obtained by curing a curable coating solution containing 10-100 wt.% fluorine- containing polyfunctional (meth)acrylic ester as a component A and 90-0 wt.% fluorine-containing polymer as a component B. The high contrast function is ensured by using a blend of a black pigment and an adhesive applied on the reduced antireflection layer. The component A is represented by formula I or the like and the component B is a polymer containing >=50 wt.% constituent units based on an ester of formula II. In the formulae I and II, X1-X3 are each H or the like, Y1 and Yu4 are each fluorolakylene or the like and (m) and (n) are each 1 or 2. |
申请公布号 |
JP2000111716(A) |
申请公布日期 |
2000.04.21 |
申请号 |
JP19980281552 |
申请日期 |
1998.10.02 |
申请人 |
NOF CORP |
发明人 |
KOMATSU SHINJI;MORIMOTO YOSHIHIRO |
分类号 |
H01J29/88;G02B1/11;G02B5/08;H01J5/08;H01J11/44 |
主分类号 |
H01J29/88 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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