发明名称 HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL
摘要 PROBLEM TO BE SOLVED: To obtain a heat-developable photosensitive material having very low volatility and producing no harmful effect on the environment and human body by incorporating a specified polyhalogen compound having a substituted aryl or heterocyclic sulfonyl group and a very low volatility. SOLUTION: The heat-developable photosensitive material contains a photosensitive silver halide, a reducible silver salt, a reducing agent, an ultrahigh contrast imparting agent, a binder and at least one compound of the formula on at least one face of the substrate. In the formula, X is a halogen, R1 is a substituted aryl or a heterocyclic group, R2 is a substituent, (r) is an integer of 0-4, and in the case of r>=2, plural symbols R2 may be mutually the same or different. Since the compound having a very low volatility is used, the photosensitive material is very low in fog, high in safety and high in contrast.
申请公布号 JP2000112070(A) 申请公布日期 2000.04.21
申请号 JP19980292864 申请日期 1998.09.30
申请人 FUJI PHOTO FILM CO LTD 发明人 WATANABE KATSUYUKI;SAKAI MINORU;OYA TOYOHISA
分类号 G03C1/498;(IPC1-7):G03C1/498 主分类号 G03C1/498
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