| 摘要 |
The present invention relates to a composition for removing resist, polymeric material and/or etching residue from a substrate comprising titanium or an alloy thereof, the composition comprising hydroxylamine or a derivative thereof and one or more compounds selected from 2,3-dihydroxytetralin, 2,3-dihydroxynaphthalene and/or nordihydroguaiaretic acid. |
| 申请人 |
EKC TECHNOLOGY, LTD;HOLMES, DOUGLAS;ARKLESS, LESLIE, W.;LEE, WAI, MUN;AFFROSSMAN, STANLEY;PETHRICK, RICHARD, A. |
发明人 |
HOLMES, DOUGLAS;ARKLESS, LESLIE, W.;LEE, WAI, MUN;AFFROSSMAN, STANLEY;PETHRICK, RICHARD, A. |
