发明名称 |
SANDBLASTING AGENT, WAFER TREATED WITH THE SAME, AND METHOD OF TREATMENT WITH THE SAME |
摘要 |
A sandblasting agent which can prevent fouling by metal ions; and a method of sandblasting a silicon wafer with the agent. The method comprises using a sandblasting agent containing a chelating agent. The chelating agent is selected, for example, among the following (1) to (4) and salts of these. (1) Nitrilotriacetic acid (NTA); (2) Ethylenediaminetetraacetic acid (EDTA); (3) Diethylenediamine-N,N,N'',N''-pentaacetic acid (DTPA); (4) Cyclohexanediaminetetraacetic acid (CyDTA).
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申请公布号 |
WO0021716(A1) |
申请公布日期 |
2000.04.20 |
申请号 |
WO1999JP05600 |
申请日期 |
1999.10.12 |
申请人 |
SHIN-ETSU HANDOTAI CO., LTD.;OTAKA, TOSHIAKI;FUKAMI, TERUAKI |
发明人 |
OTAKA, TOSHIAKI;FUKAMI, TERUAKI |
分类号 |
B24C11/00;H01L21/304;(IPC1-7):B24C11/00 |
主分类号 |
B24C11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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