发明名称 SANDBLASTING AGENT, WAFER TREATED WITH THE SAME, AND METHOD OF TREATMENT WITH THE SAME
摘要 A sandblasting agent which can prevent fouling by metal ions; and a method of sandblasting a silicon wafer with the agent. The method comprises using a sandblasting agent containing a chelating agent. The chelating agent is selected, for example, among the following (1) to (4) and salts of these. (1) Nitrilotriacetic acid (NTA); (2) Ethylenediaminetetraacetic acid (EDTA); (3) Diethylenediamine-N,N,N'',N''-pentaacetic acid (DTPA); (4) Cyclohexanediaminetetraacetic acid (CyDTA).
申请公布号 WO0021716(A1) 申请公布日期 2000.04.20
申请号 WO1999JP05600 申请日期 1999.10.12
申请人 SHIN-ETSU HANDOTAI CO., LTD.;OTAKA, TOSHIAKI;FUKAMI, TERUAKI 发明人 OTAKA, TOSHIAKI;FUKAMI, TERUAKI
分类号 B24C11/00;H01L21/304;(IPC1-7):B24C11/00 主分类号 B24C11/00
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