发明名称 |
Method of cleaning substrates |
摘要 |
<p>A method of cleaning electronic components, characterized by cleaning with an oxidizing cleaning fluid, followed by cleaning with a reducing cleaning fluid with the application of ultrasonic vibrations. This provides a simple cleaning method which can remove metal, organic and fine particle contaminants on the surface of electronic components, and especially those on silicon bases, and also suppress an increase in the roughness of base surface on the order of atoms during cleaning processes.</p> |
申请公布号 |
EP0994505(A2) |
申请公布日期 |
2000.04.19 |
申请号 |
EP19990308039 |
申请日期 |
1999.10.12 |
申请人 |
KURITA WATER INDUSTRIES LTD. |
发明人 |
MORITA, HIROSHI;IDA, JUNICHI |
分类号 |
H01L21/304;B08B3/12;H01L21/306;(IPC1-7):H01L21/306 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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