发明名称 PHOTO-CURABLE RESIN COMPOSITION AND CURED FILM
摘要 PROBLEM TO BE SOLVED: To provide photo-curable resin compositions applicable even to low heat-resistant substrates, and cured films to be obtained therefrom which are excellent in adhesion to plastics and furthermore, excellent in reflection proofness and the like. SOLUTION: Photo-curing resin compositions comprise (A) a hydrolyzate of a hydrolyzable silane compound represented by formula (I): (R1)pSi(X)4-p (wherein R1 is a 1-12C non-hydrolyzable organic group; X is a hydrolyzable group; and p is an integer of 0-3) or the like or formula (II): (Y) (R1)qSi(X)3-q (wherein R1 and X are the same as defined in formula (I); Y is an isocyanate group or the like; and q is an integer of 0-2) or the like, (B) a fluorine-containing polymer, and (C) a photo-acid generator.
申请公布号 JP2000109694(A) 申请公布日期 2000.04.18
申请号 JP19990219939 申请日期 1999.08.03
申请人 JSR CORP 发明人 SUGIYAMA NAOKI;SEKIGUCHI MANABU;SATO HOZUMI
分类号 C08L83/04;C08L27/12;C09D5/00;C09D127/12;C09D183/04;(IPC1-7):C08L83/04 主分类号 C08L83/04
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