发明名称 HYDROGEN CHLORIDE ABSORBING DEVICE AND ABSORBING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To prevent a gas supply pipe to a column and a peripheral part thereof from becoming corroded and thereby enable a device to be operated continuously for a long time by fitting a tantalum sleeve to the inner wall of the gas supply pipe on the column with a water spray means having water spray holes installed at the internal upper part and the gas supply pipe installed at the lower part. SOLUTION: A water spray device 3 is installed at the inner upper part of a column 1. In a gas supply pipe 5, a water supply pipe 7 made of tantalum with a spray nozzle 8 or the like fitted at the tip, is installed. A dry gas containing hydrogen chloride is supplied to the gas supply pipe 5 and then is supplied into an absorption column 1 while the gas is cooled by water sprayed from the spray nozzle 8 after being fed from the water supply pipe 7. In this case, a tantalum sleeve 6 is mounted in the gas supply pipe 5 so that the corrosion of a material for piping is inhibited and at the same time, the gas supply pipe 5 is protected against a hot gas. After this procedure, the gas is brought into counter-contact with the spray in the absorption column 1 to cool/absorb the gas. On the other hand, the water absorbing the hydrogen chloride is unloaded from a line 10 and then is circulated for use.</p>
申请公布号 JP2000107548(A) 申请公布日期 2000.04.18
申请号 JP19980277481 申请日期 1998.09.30
申请人 SHIN ETSU CHEM CO LTD;TOYO ENG CORP 发明人 TSUMURA HIROSHI;UMEMURA KAZUNOBU;KOIDE HIROYUKI;TESHIGAWARA SEIICHI;NOSAKA RYOHEI
分类号 B01D53/14;B01D53/18;(IPC1-7):B01D53/14 主分类号 B01D53/14
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