| 摘要 |
PROBLEM TO BE SOLVED: To obtain a chromium etching compsn. good in wattability to a chromium material in which a pattern is formed by a resist material, also low in foaming properties and moreover giving excellent etching effect by allowing it to contain ceriumic salt, acid, adhesive tension reinforcing agent and an alkylsulfonic compd. and to obtain an etching method using this. SOLUTION: Preferably, this compsn. is an aq. soln., the alkylsulfonic compd. has 1 to 6 carbon atoms, the ceriumic salt is the one of strong acid or double salt of this and ammonium salt, and the acid is the one which does not precipitate the ceriumic salt in the compsn. The adhesive tension increasing agent is a surfactant and is an alkylsulfonic compd. which may contain 7-16C fluorine atoms or the salt thereof, specially the one contg. one or more fluorine atoms is preferable, and, a perfluoro compd. in which all of the hydrogen atoms are substituted by fluorine atoms is more preferable.
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