| 摘要 |
PROBLEM TO BE SOLVED: To prepare a polishing agent slurry which, when used in polish leveling in the formation of, especially, the element of a composite thin-film magnetic head, can satisfy the surface roughness of a composite material, and can reduce the difference among the levels of the component materials. SOLUTION: There is provided an aqueous polishing agent slurry prepared by adding to an aqueous solution prepared by preparing an aqueous solution of (b) a water-soluble inorganic aluminum salt or a nickel salt and an aqueous solution of (c) a water-soluble chelating agent, mixing these solutions with each other, storing the resulting solution for at least one day, and separating the precipitated difficultly water-soluble crystals from the solution, (a) alumina abrasive grains having a mean particle diameter of 0.05-1μm, 0.1-10 wt.%,(d) polishing oil and (a) alumina abrasive grains-mixed with an necessary amount of an aqueous medium, 0.1-3 wt.% (b) water-soluble chelating aluminum salt or nickel salt, 0.1-3 wt.% (c) water-soluble chelating agent, and 0.1-10 wt.% (d) polishing oil, wherein the content of the difficultly water-soluble chelate aluminum salt or chelate nickel salt is 0.1 wt.% or below.
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