Surface treatment of antireflective layer in chemical vapor deposition process

摘要

In a chemical vapor deposition process a surface layer is formed on an antireflective layer to prevent amines in the antireflective layer from neutralizing acid components formed during the exposure of an overlying photoresist layer. The surface layer is formed by introducing an oxygen-containing gas such as N2O into the CVD chamber in the presence of radio frequency power, after the antireflective layer has been formed.