发明名称 PHOTODEGRADABLE ETHYLENE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To obtain an ethylene resin composition which is adapted without detriment to moldability and the properties of a molding so that a molding made therefrom may be easily degraded by irradiation with ultraviolet light and can be easily disposed of when it becomes a waste by incorporating a photosensitizer in a specified ethylene polymer. SOLUTION: 0.01-5 pts.wt., desirably, 0.03-3 pts.wt. photosensitizer is incorporated in 100 pts.wt. ethylene polymer obtained by reaction in the presence of a catalyst comprising a metallocene transition metal compound and at least one compound selected among an aluminumoxy compound, a Lewis acid, and an ionic compound which can convert the metallocene compound into a cation upon reaction therewith, having a melt flow rate of 0.01-1,000 g/10 min and a density of 0.85-0.97 g/cm3, containing at least 0.15, in total, internal unsaturations of formulae I to IV per 1,000 carbon atoms, and containing at least 0.1, in total, trisubstituted unsaturation of formula III or IV per 1,000 carbon atoms, and the mixture is kneaded at 170-250 deg.C, and granulated. In the formuae, R is 1C or higher hydrocarbon group.
申请公布号 JP2000109619(A) 申请公布日期 2000.04.18
申请号 JP19980286625 申请日期 1998.10.08
申请人 JAPAN POLYCHEM CORP 发明人 NAKA YOSHIHEI;UEHARA YUMITO
分类号 C08J5/18;C08F4/642;C08F4/6592;C08K5/08;C08K5/098;C08L23/04;(IPC1-7):C08L23/04 主分类号 C08J5/18
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