CLAMP USED IN SPUTTERING APPARATUS

摘要

PURPOSE: A clamp prevents a supporting part of the clamp from contacting with a side of a wafer. CONSTITUTION: A clamp(110) prevents to contact with a wafer(112) after sputtering process by changing the structure of the clamp fixing the wafer placed on a heating plate(114). The wafer is heated after fixed by the clamp, and placed on the heating plate in a reactor for performing the sputtering process. The clamp comprises a cylindrical supporting part(116) projected vertically on one side of a ring-shaped circular plate. The inside diameter of the supporting part is larger than the diameter of the wafer by more than 1 mm.