| 摘要 |
PURPOSE: A particle sampling apparatus, a driving method of the same, and a semiconductor device manufacturing system by application of the same are provided to integrate a purge system to provide reliable particle analysis, to maintain a proper pressure difference between a high vacuum processing chamber and a pumping line, to prevent back-flow of sample gas into the processing chamber, and to be manual or automated. CONSTITUTION: The sampling apparatus for particle analysis comprises a sampling line including, in order, a sampling port(24), a sampling air valve(34d), a particle sampler(10) and an isolation valve(22), a pumping line connected between the isolation valve(22) and a pump(20), and a discharge line connected between the pump(20) and a discharge port(28). The apparatus includes a purge line having, in order, a purge gas source(26b), a purge air valve(34b), and a divergence end. A purge-sampler line connects the divergence end to the sampling line between the sampling air valve(34d) and the particle sampler(10), and includes a purge-sampler air valve(34c). A purge-pump line connects the divergence end to the pumping line, and includes a purge-pump air valve(34a). The apparatus also includes an isolation valve bypass line connected at one end to the sampling line between the particle sampler(10) and the isolation valve(22), connected at the other end to the pumping line between the isolation valve and the purge-pump line, and including a bypass air valve(3e). A control unit controls the operation of the isolation valve, the pump, and the above named air valves.
|
