METHOD FOR MANUFACTURING MML SEMICONDUCTOR DEVICES

摘要

PURPOSE: A fabrication method of MML(Merged Memory Logic) devices is provided to prevent a short and a crack by improving a uniformity of roughness of a scribe region. CONSTITUTION: A method of MML device having a scribe region(b) and a die region(a)comprises the steps of forming a photoresist layer(15) having a contact portion(20) in the scribe region(b), growing a field oxide(25) on the scribe and the die regions of a semiconductor substrate(10) via the contact portion(20) of the photoresist layer(15), forming a silicide layer(30) on the semiconductor substrate except for the field oxide, and forming a metal layer(35) on the resultant structure of the die region(a).