| 摘要 |
PURPOSE: A silicide transparent electrode and method for preparing thereof is provided to use the pixel electrode of a TFT-LCD, the pixel electrode of an organic EL, the pixel electrode of a FED, the pixel electrode of other display, the transparent electrode of a solar cell. CONSTITUTION: A method for preparing silicide transparent electrode comprises a step depositing metal having the thickness of 3A or less on an amorphous silicon thin film having the thickness of 40A and then forming silicide. The metal is one of Ni, Ti, Co, Fe, Cr, Pd and deposited by plasma deposition method. The silicide is formed by being applied electric field after being deposited as a thin film.
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