| 摘要 |
PURPOSE: A chemical wetting apparatus is provided to be capable of performing a wetting process without stopping the apparatus since it is separately installed from a chemical center supply apparatus. CONSTITUTION: A chemical wetting apparatus includes a pre wetting unit(12) for removing an alien substance adhered to a filter(11). A main wetting unit(13) is installed adjacent to the pre wetting unit(12) and makes the same environment to the filter(11) that is actually used. The pre wetting unit(12) consists of a circulating unit(20) for circulating isopropyl alcohol(IPA) and DI water, an IPA supplier(30) connected to one side of the circulating unit(20) and for supplying IPA, a drain unit(40) for draining a solution used in the circulating unit(30), a DI supplier(50) for supplying DI to the circulating unit(30), a purge line(14) for supplying a purge gas(PN2, PROCESS NITROGEN) and a condensed air(CDA) supply line(15) for supplying CDA. The main wetting unit(13) consists of a DI water measuring container(61) for measuring DI from the DI supply line(51), a chemical measuring container(62) for measuring chemicals, a mixed tank(63) for mixing two types of solutions measured in the DI water/chemical measuring containers(61,62), a filter mounting unit(64) installed to mount the filter(11) around the mixed tank(63), a pump(65) installed below the filter mounting unit(64) for circulating the solutions, the first/second/third wetting zones(60,70,80) installed around the pump(65) and each having a chemical bottle(66) for containing the chemicals, a DI water measuring container(91) for measuring DI water, a filter mounting unit(92) installed below the DI water measuring container(91), a pump(93) installed below the filter mounting unit(92), and the fourth wetting zone(90) having a chemical bottle(94) installed around the pump(93).
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