ION-INJECTION APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PURPOSE: An ion-injection apparatus is provided to increase productivity of a semiconductor device by improving an o-ring of an orient and prevent a wafer from moving or being dropped by loading/unloading the wafer after the wafer is adhered closely. The ion-injection apparatus can minimize particles caused by the abrasion of the o-ring. CONSTITUTION: An ion-injection apparatus comprises an orient(20) capable of loading/unloading a wafer during an ion-injection process, the orient(20) further comprising an o-ring(22) of teflon material having a predetermined area along the circumference of the orient(20).