| 摘要 |
PURPOSE: A method of measuring a flare is to measure threshold energy and the energy of the flare and to calculate an accurate flare value, thereby obtaining an effective lithography simulation. CONSTITUTION: The method includes the steps of measuring a threshold energy and measuring the energy of the flare. The threshold energy is to develop a photoresist of an exposed area. The energy of a flare is to develop the photoresist of an unexposed area. The flare value is calculated by using the following formula, Flare(%)=100*Eflare/Eth. To measure the flare, a stepper and a scanner are used. A pattern used to measure the flare is in the form of a rectangular shape. The threshold energy which is required to develop completely the photoresist of the exposed area is 8,25mJ/cm¬2 in the scanner, and the threshold energy being 290 milli-seconds in the stepper. The photoresist comprises both a positive photoresist and a negative photoresist.
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