发明名称 SURFACE TREATING APPARATUS FOR TREATING SAMPLE WITH COMPLEX SHAPE USING PLASMA
摘要 PURPOSE: A surface treating apparatus is provided to uniformly distribute the gas around a sample with complex shape, thereby enhancing the surface treatment effect of the sample. CONSTITUTION: A surface treating apparatus comprises a chamber(1), a vacuum pump(5,6)for providing vacuum within the chamber, a vacuum level measurement device(7,8) for measuring a vacuum level within the chamber, a sample holder for holding the sample for surface treatment, a power supplying device(3) for supplying the bias voltage to a sample(2) and an electrode(4). The electrode has a shape corresponding to that of the sample to be surface-treated. A gap is uniformly maintained between the surface of the sample and the electrode.
申请公布号 KR20000021084(A) 申请公布日期 2000.04.15
申请号 KR19980040022 申请日期 1998.09.25
申请人 LG ELECTRONICS INC. 发明人 HA, SAM CHEOL;LEE, HYEON UK;KIM, CHEOL HWAN;AN, SEUNG PYO
分类号 H01J37/00;(IPC1-7):H01J37/00 主分类号 H01J37/00
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